Characteristics of tungsten silicide WSi2 powder

Characteristics of tungsten silicide WSi2 powder

Tungsten silicide WSi2 powder (CAS 12039-88-2) has high melting point, high corrosion resistance, high oxidation resistance, and good

Electrical conductivity, high temperature ductility, is the intermediate phase of the binary alloy system.

Overview of tungsten silicide WSi2 powder

Silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm. It forms 1000°C. It is usually used as a shunt for polysilicon lines to increase its conductivity and increase signal speed. The silicide layer can be prepared by chemical vapor deposition, for example, using monosilane or dichlorosilane and tungsten hexafluoride as raw material gases. The deposited film is non-stoichiometric and requires annealing to be converted to a more final stoichiometric form. Tungsten silicide can replace the early tungsten film. Tungsten silicide can also be used in microelectromechanical systems and anti-oxidation coatings.

Tungsten silicide WSi2 powder application

Tungsten silicide WSi2 powder is used as an electric shock material in microelectronics, shunting on polysilicon wires, anti-oxidation coating and resistance wire coating. Tungsten silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm. It is formed at 1000°C. It is usually used as a shunt for polysilicon lines to increase its conductivity and increase signal speed. The tungsten silicide layer can be prepared by chemical vapor deposition, such as vapor deposition. Use monosilane or dichlorosilane and tungsten hexafluoride as raw material gas. The deposited film is non-stoichiometric and requires annealing to be transformed into a more conductive stoichiometric form.

Tungsten silicide can replace the earlier tungsten film. Tungsten silicide is also used as a barrier layer between silicon and other metals.

Tungsten silicide is also very valuable in microelectromechanical systems, among which tungsten silicide is mainly used as a thin film for manufacturing microcircuits. For this purpose, the tungsten silicide film can be plasma-etched using, for example, silicide.

Tungsten silicide WSi2 powder price

The price of tungsten silicide WSi2 varies randomly with factors such as production cost, transportation cost, international situation, exchange rate, and market supply and demand of tungsten silicide WSi2. Tanki New Materials Co.,Ltd. aims to help various industries and chemical wholesalers find high-quality, low-cost nanomaterials and chemicals by providing a full set of customized services. If you are looking for tungsten silicide WSi2, please feel free to contact us for the latest price of tungsten silicide WSi2.

Tungsten silicide WSi2 powder supplier

As a global tungsten silicide WSi2 powder supplier, Tanki New Materials Co. Ltd has extensive experience in the performance, application and cost-effective manufacturing of advanced and engineering materials. The company has successfully developed a series of powder materials (molybdenum disilicide, silicid Titanium, calcium silicide, iron boride), high-purity targets, functional ceramics and structural devices, and provide OEM services.