How is tantalum nitride TaN powder produced?

How is tantalum nitride TaN powder produced?

1. Tantalum powder is directly nitridated with nitrogen or ammonia at about 1100°C;

2. Tantalum nitride is prepared with tantalum and nitrogen as raw materials. The reaction formula is as follows: 2Ta + N2 = 2TaN.

Product performance of tantalum nitride TaN powder

The molecular formula of tantalum nitride is TaN and the molecular weight is 194.95. Tantalum nitride is insoluble in water and acid, slightly soluble in aqua regia, soluble in potassium hydroxide, decomposes to release ammonia, and releases nitrogen when heated to 2000°C.

Overview of tantalum nitride TaN powder

Tantalum nitride is a chemical material with a molecular formula of TaN and a molecular weight of 194.95. The material used to make precision thin-layer resistors resistant to water vapor. During integrated circuit manufacturing, these films are deposited on top of silicon wafers to form thin film surface mount resistors. Tantalum nitride is a black hexagonal crystal. The relative density is 13.4, the melting point is 3090℃, the microhardness is 1100kg/mm2, the thermal conductivity is 9.54W/(m•K), and the resistivity is 128μΩ•cm.

Tantalum δnitRIDE is a sodium chloride type yellow-green crystal with a relative density of 15.6. The lattice constants are A = 0.4336nm and C = 0.4150nm. The melting point is 2950℃, the microhardness is 3200kg/mm2, and the transition point temperature is 17.8K.

Insoluble in water and acid, slightly soluble in aqua regia, soluble in potassium hydroxide, decomposes to release ammonia, and nitrogen is released when heated to 2000°C.

Application of tantalum nitride TaN powder

The material used to make precision chip resistors, tantalum nitride resistors can resist the erosion of water vapor.

Used as a superhard material additive to prepare pure tantalum pentachloride: used for spraying to increase the electrical stability of transformers, integrated circuits, and diodes

Tantalum nitride is sometimes used in integrated circuit manufacturing to form a diffusion barrier or "glue" layer between copper or other conductive metals. In the case of BEOL treatment (approximately 20 nm), the copper is first covered with tantalum, and then TaN is coated by physical vapor deposition (PVD). Before mechanical processing (grinding/polishing), more copper is applied to the barrier coating by PVD, and then electrolytic coating is filled on it.

Tantalum nitride is also suitable for thin-film resistors. Compared with nickel-chromium resistors, it has the advantage of forming a moisture-proof passivation oxide film.

Tantalum nitride can be used as an additive for superhard materials to produce pure tantalum pentachloride, which can be used for spraying and improving the electrical stability of transformers, integrated circuits and diodes.

The price of tantalum nitride TaN powder

The price of tantalum nitride TaN powder will vary randomly with factors such as the production cost of tantalum nitride TaN powder, transportation cost, international situation, and market supply and demand of tantalum nitride TaN powder. Tianji New Materials Co., Ltd. aims to help various industries and chemical wholesalers find high-quality, low-cost nanomaterials and chemicals by providing a full set of customized services. If you are looking for tantalum nitride TaN powder, please feel free to send an inquiry about tantalum nitride TaN powder to get the latest price.

Tantalum Nitride TaN Powder Supplier

As a global supplier of tantalum nitride TaN powder, Tanki New Materials Co., Ltd. has extensive experience in the performance, application and cost-effective manufacturing of advanced engineering materials. The company has successfully developed a series of powder materials (including boron carbide, aluminum carbide, titanium carbide, etc.), high-purity targets, functional ceramics and structural devices, and provides OEM services.