Application of Zinc Nitride Zn3N2

Overview of zinc nitride Zn3N2 powder

Zinc nitride, chemical formula is Zn3N2, gray crystal, easily soluble in hydrochloric acid. It quickly decomposes into zinc hydroxide and ammonia in cold water. It is prepared by reacting zinc powder in a stream of ammonia at 500-600°C or decomposing zinc amine by heating. Zinc Nitride (Zn3N2) is an inorganic compound of zinc and nitrogen, which usually produces (blue) gray crystals. It is a semiconductor. In its pure state, it has an anti-BixByite structure. Our zinc nitride Zn3N2 powder (CAS 1313-49-1) has high purity, ultra-fine particle size and large specific surface area.

Application of Zinc Nitride Zn3N2 Powder

Zinc nitride Zn3N2 powder is used in lithium electronic batteries; energy storage materials; catalysts, etc.;

Zinc Nitride Zn3N2 powder can be used in optical and electronic devices. It is doped with oxygen to make a potential nitrogen-based semiconductor transparent conductor.

The stability of Zn3N2 films prepared by most methods is poor, and the photoelectric properties of ZnO films prepared by the same method are also quite different. There is an urgent need to obtain a preparation method with high crystal quality, simple control and reproducibility. The preparation method of the zinc nitride film is to prepare the zinc nitride film by the atomic layer deposition technology, which can precisely adjust the band gap of the zinc nitride film.

1. Used to prepare zinc nitride film

Zinc nitride (Zn3N2) has an anti-biferrosite structure, has strange electrical and optical properties, and whether zinc oxide is an indirect band gap or a direct band gap semiconductor, and what the band gap is, has always been a major controversy in the industry and academia The problem, the difference in preparation methods and growth conditions, has a significant effect on its band gap. For example, in the prior art, methods such as magnetron sputtering, chemical vapor deposition, electrostatic electrolysis, and molecular beam epitaxy can be used to prepare zinc nitride thin films.

However, the stability of zinc nitride films prepared by most methods is poor, and the optical and electrical properties of zinc oxide films prepared by the same method are also quite different. There is an urgent need to obtain a preparation method with high crystalline quality, simple, easy, and repeatable control. It can overcome the problems of low coating yield, high production cost, and low production efficiency when using black ink screen printing to prepare the light-shielding layer in the BM area of the touch screen cover in the prior art. Bubbles can not achieve the defect of perfect fit. Provide a touch screen cover and touch screen cover film made of zinc nitride.

The technical solutions adopted are:

A method for preparing a zinc nitride film includes the following steps:

(1) Place the substrate in the reaction chamber of the atomic layer deposition equipment;

(2) Pass a zinc-containing precursor source into the reaction chamber of the atomic layer deposition equipment, and zinc atoms in the zinc-containing precursor source are adsorbed on the surface of the substrate;

(3) Pass a nitrogen-containing precursor source into the reaction chamber of the atomic layer deposition equipment, and then ionize the nitrogen-containing precursor source through plasma. After ionization, the nitrogen atoms in the nitrogen-containing precursor source are partially deposited , Forming a nitrogen-zinc covalent bond with zinc atoms on the surface of the substrate; or, ionizing a nitrogen-containing precursor source through plasma, and then passing the ionized nitrogen-containing precursor source into the atomic layer deposition equipment for reaction In the cavity, after ionization, the nitrogen atoms in the nitrogen-containing precursor source are partially deposited to form a nitrogen-zinc covalent bond with the zinc atoms on the surface of the substrate;

(4) Repeat the steps (2) and (3) to grow the zinc nitride film layer by layer.

The invention is a simple and easy to implement, high crystalline quality and repeatable preparation method. The nitrogen source is introduced into the atomic layer deposition system through plasma, and then the chamber temperature, vacuum degree, cycle period, plasma conditions, etc. are adjusted and controlled. Conditions, precisely control the band gap of the prepared zinc nitride film. The invention can obtain various high-quality zinc nitride films with adjustable band gaps according to different electrical and optical application requirements.

2. Used to prepare a touch screen cover and touch screen cover film

With the advancement of technology and the development of smart devices, there is an increasing demand for touch screens as the main window for human-computer interaction. The solution of CN201620468912.6 can overcome the problem of low coating yield, high production cost, and low production efficiency when using black ink screen printing to prepare the light-shielding layer in the BM area of the touch screen cover in the prior art, and the resulting product is bonded to the liquid crystal display When in use, it is easy to produce bubbles and cannot achieve the defect of perfect fit. A touch screen cover and a touch screen cover film made of zinc nitride are provided.

The touch screen cover film of the utility model adopts zinc nitride film as the functional layer of the black film, the surface reflectivity is low, the production cost is low; the surface hardness is high, the scratch resistance and the wear resistance are strong; the surface energy is high, It can effectively fit the liquid crystal display; the thickness is about 60~200nm, which can eliminate the step effect. The utility model solves the above technical problems through the following technical solutions. The utility model provides a touch screen cover film, which includes a zinc nitride (Zn3N2) film and a silicon nitride (Si3N4) film; wherein the thickness of the zinc nitride film is 10-50nm. Wherein, if the thickness of the zinc nitride film is greater than 50 nm, the adhesion of the film will decrease; if the thickness of the zinc nitride film is less than 10 nm, it will transmit light and cannot achieve the effect of light-tightness. The zinc nitride film has a strong absorption of visible light, has a black appearance, and serves as a functional layer of a black film.It includes a zinc nitride (Zn3N2) film, a silicon nitride (Si3N4) film and a protective film in turn; wherein the thickness of the zinc nitride film is 10nm; the thickness of the silicon nitride film is 50nm, and the protective film is in the field Conventional plastic protective film. The touch screen cover of this embodiment includes a glass substrate and the aforementioned touch screen cover film, and the zinc nitride film of the touch screen cover film is connected to the glass substrate. 1 is a schematic diagram of the structure of the touch screen cover plate of the embodiment, wherein 1 is a protective film, 2 is a silicon nitride film, 3 is a zinc nitride film, and 4 is a glass substrate.

Zinc nitride Zn3N2 powder price

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Zinc Nitride Zn3N2 Powder Supplier

As a global zinc nitride Zn3N2 powder supplier, Tanki New Materials Co., Ltd. has extensive experience in the performance, application and cost-effective manufacturing of advanced engineering materials. The company has successfully developed a series of powder materials (molybdenum disilicide, lanthanum nitride (LaN powder, calcium silicide, iron boride), high-purity targets, functional ceramics and structural devices, and provides OEM services.