How is cobalt silicide CoSi2 powder produced?

Overview of cobalt silicide CoSi2 powder

Cobalt disilicide, chemical formula CoSi2. The molecular weight is 115.11. Dark brown rhomboid crystals. The melting point is 1277°C, the relative density is 5.3. It is oxidized at 1200°C and corrodes the surface. It reacts with fluorine at low temperatures and with chlorine at 300°C. Hydrogen fluoride, dilute solutions, concentrated nitric acid and sulfuric acid may also be violently attacked by molten alkali. It reacts slowly with boiling concentrated hydrochloric acid.

Cobalt silicide CoSi2 powder (CAS 12017-12-8) has high melting point, strong corrosion resistance, high oxidation resistance, good conductivity, good high temperature ductility, and is the intermediate phase of the binary alloy system.

CoSi2 has low resistivity and good thermal stability, and is widely used as contacts in large-scale integrated circuits. In addition, CoSi2 has a crystal structure similar to Si, so an epitaxial CoSi2/Si structure can be formed on a Si substrate to study the interface characteristics of epitaxial metal silicon.

How is cobalt silicide CoSi2 powder produced?

Generally speaking, the manufacturing method of cobalt disilicide is to first form a metal cobalt (CO) layer on a silicon substrate, and then undergo two annealing treatments to convert the cobalt into cobalt disilicide. The first annealing process involves diffusing the cobalt shilling into the siliceous substrate to form a cobalt silicate (COSi) layer. The second annealing process is to convert the cobalt silicate layer into low-resistance cobalt disilicide to reduce the resistance of the component.

Cobalt silicide CoSi2 powder application

Cobalt silicide CoSi2 powder is used in optoelectronic equipment, electronic equipment, energy equipment, lasers, semiconductors, etc.

Silicide nanostructures have potentially important applications in a series of nanoelectronics: Semiconductor silicide nanostructures (FeSi2) can be used to prepare nanoelectronic active devices, and may have very important applications in silicon-based nanolight emitting devices. Metal silicides (CoSi2, NiSi2) can be used as nanowires in future quantum computers and fault-tolerant terahertz nanocircuit computers. Since the epitaxial silicide conductor can be prepared on a silicon substrate, compared with ordinary metal nanowires, since there is no grain boundary, its performance will be greatly improved. Gold nanostructures can also be used as single-molecule or multi-molecular nanoelectrodes in molecular electronics during the processing of semiconductor components.

Cobalt silicide CoSi2 powder price

The price of cobalt silicide CoSi2 powder products varies randomly with factors such as production cost, transportation cost, international situation, exchange rate, and supply and demand of cobalt silicide CoSi2 powder products. Tanki New Materials Co., Ltd. aims to help various industries and chemical wholesalers find high-quality, low-cost nanomaterials and chemicals by providing a full set of customized services. If you are looking for cobalt silicide CoSi2 powder product materials, please feel free to contact to obtain the latest price of cobalt silicide CoSi2 powder.

Cobalt silicide CoSi2 powder supplier

As a global cobalt silicide CoSi2 powder supplier, Tanki New Materials Co., Ltd. has extensive experience in the performance, application and cost-effective manufacturing of advanced and engineered materials. The company has successfully developed a series of powder materials (molybdenum disilicide, titanium silicide, calcium silicide, iron boride), high-purity targets, functional ceramics and structural devices, and provides OEM services.