Overview of the properties of tungsten silicide WSi2

Tungsten silicide is insoluble in water and aqua regia, but soluble in a mixture of nitric acid and hydrofluoric acid. Used to make anti-oxidation coating and resistance wire coating agent.

Tungsten silicide properties

Blue-gray tetragonal crystal, melting point>900℃, compound Tungsten Silicide (WSi2)

Preparation method of tungsten silicide

(1) Massage the tungsten powder and silicon powder into the ingredients at a molar ratio of 1:2, and the titanium powder and graphite powder into the ingredients at a molar ratio of 1:1, and then mix them evenly.

(2) Pack the W-Si mixed powder in the center of the crucible. The Ti-C mixed powder is evenly packed between the W-Si mixed powder and the crucible. Finally, a layer of Ti-C mixed powder is placed on top of all the mixed powders, inside the crucible The weight ratio of Ti-C mixed powder and W-Si mixed powder is (0.8~1.2):1

(3) Put the crucible containing the mixed powder into a closed reactor, evacuated and filled with argon gas, and then energize the tungsten wire to initiate the reaction between the mixed materials.

(4) After cooling, take out the reacted materials, separate the titanium carbide and tungsten disilicide, and obtain titanium carbide and tungsten disilicide powders after being crushed separately.

Overview of tungsten silicide WSi2 powder

Silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm. It forms 1000°C. It is usually used as a shunt for polysilicon lines to increase its conductivity and increase signal speed. The silicide layer can be prepared by chemical vapor deposition, for example, using monosilane or dichlorosilane and tungsten hexafluoride as raw material gases. The deposited film is non-stoichiometric and requires annealing to be converted to a more final stoichiometric form. Tungsten silicide can replace the early tungsten film. Tungsten silicide can also be used in microelectromechanical systems and anti-oxidation coatings.

Tungsten silicide WSi2 powder application

Tungsten silicide WSi2 powder is used as an electric shock material in microelectronics, shunting on polysilicon wires, anti-oxidation coating and resistance wire coating. Tungsten silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm. It is formed at 1000°C. It is usually used as a shunt for polysilicon lines to increase its conductivity and increase signal speed. The tungsten silicide layer can be prepared by chemical vapor deposition, such as vapor deposition. Use monosilane or dichlorosilane and tungsten hexafluoride as raw material gas. The deposited film is non-stoichiometric and requires annealing to be transformed into a more conductive stoichiometric form.

Tungsten silicide can replace the earlier tungsten film. Tungsten silicide is also used as a barrier layer between silicon and other metals.

Tungsten silicide is also very valuable in microelectromechanical systems, among which tungsten silicide is mainly used as a thin film for manufacturing microcircuits. For this purpose, the tungsten silicide film can be plasma-etched using, for example, silicide.

The price of tungsten silicide WSi2 powder

The price of tungsten silicide WSi2 powder will vary randomly with the production cost of tungsten silicide WSi2 powder, transportation cost, international tungsten silicide WSi2 powder situation, exchange rate and supply and demand of tungsten silicide WSi2 powder market. Tanki New Materials Co., Ltd. aims to help various industries and chemical wholesalers find high-quality, low-cost nanomaterials and chemicals by providing a full set of customized services. If you are looking for tungsten silicide WSi2 powder, please feel free to send an inquiry to get the latest price of tungsten silicide WSi2 powder.

Tungsten silicide WSi2 powder supplier

As a global tungsten silicide WSi2 powder supplier, Tanki New Materials Co.,Ltd has extensive experience in the performance, application and cost-effective manufacturing of advanced and engineering materials. The company has successfully developed a series of powder materials (molybdenum disilicide, silicid Titanium, calcium silicide, iron boride), high-purity targets, functional ceramics and structural devices, and provide OEM services.