Overview of High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition

High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition is an advanced technical ceramic renowned for its exceptional thermal conductivity and reliable electrical insulation. It is a key material in high-power electronics, LED lighting, and semiconductor processing, effectively managing heat in demanding applications where performance and reliability are critical.

Features of High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition

• High Thermal Conductivity: Offers excellent heat dissipation, comparable to beryllia (BeO).
• Electrical Insulation: Maintains high electrical resistivity even at elevated temperatures.
• Low Thermal Expansion: Matches the coefficient of thermal expansion of silicon, ideal for semiconductor substrates.
• Excellent Mechanical Strength: Possesses good mechanical properties for structural integrity.
• High-Temperature Stability: Performs reliably in harsh environments and at high temperatures.
• Non-Toxic: A safe alternative to beryllium oxide (BeO) ceramics.

Specification of High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition

This aluminum nitride sputtering target offers high purity, essential for demanding thin film applications. Its composition is 99.5% pure aluminum nitride. This purity level is critical. It directly influences the quality of the deposited film. Lower purity can introduce unwanted impurities. These impurities harm film performance. The target material is dense and fine-grained. This structure ensures stable sputtering rates. Consistent rates are necessary for uniform film thickness. Aluminum nitride itself possesses excellent properties. It is a good electrical insulator. It has high thermal conductivity. It is also very hard and chemically stable. These features make it valuable for electronics. Thin films of aluminum nitride are used widely. They serve as insulating layers in semiconductors. They are protective coatings on sensitive devices. They are dielectric layers in capacitors. High-purity AlN films are particularly important. They are used in advanced semiconductor packaging. They are key materials for surface acoustic wave devices. They are also vital for certain types of LEDs. The target is manufactured using specialized processes. These processes guarantee the 99.5% purity. They ensure the required density and microstructure. This target is designed for reliable performance. It meets the needs of research and production environments. Typical sizes and configurations are available. Standard shapes include discs and rectangles. Custom sizes can often be supplied. The target is packaged securely. This protects it during transport and handling. Proper storage is recommended. It keeps the target surface clean and ready for use.

Applications of High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition

High-purity 99.5% aluminum nitride sputtering targets are essential tools for creating thin films. These targets are used in a process called sputtering to deposit precise coatings onto surfaces. The high purity level ensures consistent film quality.

One key application is in the semiconductor industry. Aluminum nitride thin films act as excellent electrical insulators. They stop unwanted electrical currents between different parts of tiny circuits. This helps complex chips work reliably.

Another important use is for managing heat. Aluminum nitride moves heat away from sensitive electronic components very well. Devices like high-power transistors and LEDs generate significant heat. Using aluminum nitride films helps keep them cooler. This improves their performance and extends their lifespan.

Aluminum nitride films also serve as protective barriers. They shield underlying materials from harsh environments. This is valuable for components exposed to high temperatures or corrosive substances. The films add durability.

The optics field uses these films too. Aluminum nitride coatings can be applied to optical components. They help control light reflection and transmission properties. This is useful for lenses and specialized optical devices.

The 99.5% purity level is critical. It minimizes unwanted impurities in the deposited films. Impurities can harm the film’s electrical insulation or heat-spreading abilities. High purity guarantees the film performs as expected.

Company Profile

Tanki New Materials Co.Ltd. focus on the research and development, production and sales of ceramic products, serving the electronics, ceramics, chemical and other industries. Since its establishment in 2015, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Aerogel, Aluminum Nitride, Aluminum Oxide, Boron Carbide, Boron Nitride, Ceramic Crucible, Ceramic Fiber, Quartz Product, Refractory Material, Silicon Carbide, Silicon Nitride, ect. please feel free to contact us.

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By air, by sea, by express, as customers request.

5 FAQs of High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition

What is a high-purity aluminum nitride sputtering target?
It’s a solid disc made mainly from aluminum nitride. We make it very pure, at least 99.5%. People use it in machines for sputtering. Sputtering puts thin layers of material onto surfaces like silicon wafers.

Why is high purity important?
High purity is crucial. Impurities can ruin the thin film’s quality. Even tiny amounts of unwanted elements cause big problems. These problems include poor electrical insulation or bad heat flow in the final product. So, 99.5% purity ensures the film works right.

How do you use this target?
You mount the target inside a sputtering chamber. Then, you create a vacuum in the chamber. After that, you introduce special gases like argon. An electrical field energizes the gas. This makes ions hit the target surface. The impact knocks aluminum nitride atoms loose. These atoms fly onto the substrate, building the thin film layer by layer.

Where is this material typically used?
It’s common in making electronics. The thin films are good for insulating layers. They help manage heat well in devices. You find it in things like computer chips, LEDs, and power electronics. It’s also used for protective coatings because it’s tough and handles heat.

How should I handle and store the target?
Handle the target carefully. Avoid touching the sputtering surface directly. Fingerprints or scratches can cause issues later. Store it in a clean, dry place. Keep it safe from bumps or moisture. Use the right packing materials to prevent damage during transport.