Overview of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry is an advanced technical ceramic renowned for its exceptional thermal conductivity and reliable electrical insulation. It is a key material in high-power electronics, LED lighting, and semiconductor processing, effectively managing heat in demanding applications where performance and reliability are critical.

Features of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

• High Thermal Conductivity: Offers excellent heat dissipation, comparable to beryllia (BeO).
• Electrical Insulation: Maintains high electrical resistivity even at elevated temperatures.
• Low Thermal Expansion: Matches the coefficient of thermal expansion of silicon, ideal for semiconductor substrates.
• Excellent Mechanical Strength: Possesses good mechanical properties for structural integrity.
• High-Temperature Stability: Performs reliably in harsh environments and at high temperatures.
• Non-Toxic: A safe alternative to beryllium oxide (BeO) ceramics.

Specification of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

This high temperature AlN aluminum nitride ceramic tray heating plate serves semiconductor manufacturing. It withstands extreme heat reliably. Aluminum nitride offers outstanding thermal conductivity. This material transfers heat fast and evenly across the plate surface. Consistent temperature distribution is critical for semiconductor processes. The plate achieves this uniformity effectively.

It handles temperatures up to 500 degrees Celsius easily. Many demanding semiconductor applications need this level of heat. The plate maintains stable performance under prolonged high temperatures. Its resistance to thermal shock is excellent. Sudden temperature changes won’t damage it. This durability ensures long operational life.

The plate comes in various sizes. Common thicknesses range from 3mm to 10mm. Standard diameters include 200mm, 300mm, and larger options. Custom sizes are possible. Electrical heating elements are embedded directly within the ceramic. This design provides direct, efficient heating. Power ratings are tailored to specific size requirements. Voltage inputs are typically 110V or 220V.

It works perfectly for wafer bonding processes. The plate provides the necessary stable heat. It’s also ideal for annealing treatments. Uniform heating prevents wafer warping or stress. Other uses include thin film deposition steps. Precise temperature control is essential here. The plate delivers this control reliably.

Aluminum nitride resists chemical corrosion well. Harsh semiconductor processing environments won’t degrade it. Its electrical insulation properties are superior. High voltages pose no risk. This plate outperforms metal heaters. It heats faster and spreads heat more evenly. Semiconductor manufacturers gain consistent, high-quality results. Production yields improve significantly.

Applications of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

High temperature aluminum nitride ceramic trays are important parts in semiconductor manufacturing. These trays handle heat well and last a long time. AlN ceramic has great thermal conductivity. It moves heat quickly and evenly. This is key for precise semiconductor work.

The trays offer excellent electrical insulation. This keeps things safe when electricity is used nearby. They also resist thermal shock very well. Sudden temperature changes won’t crack them easily. This reliability matters in demanding factory settings.

These trays work perfectly as heating plates for silicon wafers. They give consistent heat across the whole wafer surface. Uniform heating is critical for making good chips. The trays are stable at very high temperatures needed for processes like diffusion and annealing.

They are also used in chemical vapor deposition (CVD) systems. The trays hold wafers while special films grow on them. The high purity of AlN ceramic prevents contamination. It doesn’t react with the chemicals used.

Etching chambers use these trays too. They survive harsh chemicals and high heat during etching steps. The material doesn’t break down or release particles. This keeps the process clean.

Vacuum environments are common in chip making. AlN ceramic trays perform well under vacuum. They don’t outgas much. This helps maintain a clean chamber atmosphere.

These trays are strong and durable. They can be used over and over again. This saves money compared to parts that wear out fast. Their long life reduces downtime for replacements.

Company Profile

Tanki New Materials Co.Ltd. focus on the research and development, production and sales of ceramic products, serving the electronics, ceramics, chemical and other industries. Since its establishment in 2015, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Aerogel, Aluminum Nitride, Aluminum Oxide, Boron Carbide, Boron Nitride, Ceramic Crucible, Ceramic Fiber, Quartz Product, Refractory Material, Silicon Carbide, Silicon Nitride, ect. please feel free to contact us.

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

What makes AlN ceramic trays good for heating?
Aluminum Nitride moves heat very well. This is vital in semiconductor work. The trays spread heat evenly across the wafer. This stops hot spots. Hot spots can ruin chips. AlN also handles high temperatures easily. It doesn’t change shape much when hot. This keeps everything stable during processing.

How hot can these AlN trays get?
These trays handle very high temperatures. They work fine past 1000°C. Some go even hotter. This is needed for many semiconductor steps. The material stays strong. It doesn’t break down or weaken at these heats.

Do the trays break easily under heat stress?
No. They resist thermal shock strongly. You heat them up fast. You cool them down fast. They don’t crack. This toughness saves money. You replace trays less often. Production keeps running smoothly.

Are AlN trays hard to handle?
They are strong. You don’t need to baby them. Normal handling is fine. But, they are still ceramic. Dropping them hard could cause damage. Just be careful like with any precision tool. They are made for tough factory life.

Why pick AlN over other ceramics?
AlN moves heat better than alumina. It beats many other ceramics too. This quick heat transfer is key. It makes processes faster. It makes results more even. AlN also resists corrosion well. Harsh chemicals in fabs don’t damage it easily. You get reliable performance long-term.