Overview of Semiconductor Grade Aluminum Nitride PVD Target

Semiconductor Grade Aluminum Nitride PVD Target is an advanced technical ceramic renowned for its exceptional thermal conductivity and reliable electrical insulation. It is a key material in high-power electronics, LED lighting, and semiconductor processing, effectively managing heat in demanding applications where performance and reliability are critical.

Features of Semiconductor Grade Aluminum Nitride PVD Target

• High Thermal Conductivity: Offers excellent heat dissipation, comparable to beryllia (BeO).
• Electrical Insulation: Maintains high electrical resistivity even at elevated temperatures.
• Low Thermal Expansion: Matches the coefficient of thermal expansion of silicon, ideal for semiconductor substrates.
• Excellent Mechanical Strength: Possesses good mechanical properties for structural integrity.
• High-Temperature Stability: Performs reliably in harsh environments and at high temperatures.
• Non-Toxic: A safe alternative to beryllium oxide (BeO) ceramics.

Specification of Semiconductor Grade Aluminum Nitride PVD Target

Semiconductor grade aluminum nitride PVD targets are crucial for making high-performance electronics. These targets need very specific properties. High purity is essential. Impurities hurt the thin films. Targets require purity levels like 99.999% or higher. This ensures clean deposition. Low levels of oxygen, carbon, and metallic impurities are critical. Density must be high too. Targets need to be near theoretical density. This avoids arcing during sputtering. It also gives stable film growth. Grain size control matters. Fine, uniform grains are preferred. Submicron grain sizes are typical. This helps achieve smooth, dense films. Phase composition is vital. Only the pure wurtzite phase is acceptable. Other phases harm the film quality. The crystal structure must be correct. Surface finish needs attention. A smooth, defect-free surface is necessary. Low Ra values are standard. Flatness and parallelism are also important. This ensures even sputtering. Target dimensions must be precise. They fit specific sputtering tools. Certifications are often required. Suppliers provide material certifications. These confirm the specs are met. Traceability is important for quality control. ISO standards might apply. These targets are used for demanding applications. They deposit thin films on semiconductor wafers. The films act as insulators or heat spreaders. Performance relies on the target quality. Consistent material properties are non-negotiable. This guarantees reliable manufacturing processes.

Applications of Semiconductor Grade Aluminum Nitride PVD Target

Aluminum nitride is important for making advanced electronics. It has special properties needed for semiconductor chips. Semiconductor grade aluminum nitride PVD targets are key tools for chip makers. PVD means Physical Vapor Deposition. It’s a way to put very thin layers of material onto silicon wafers.

These aluminum nitride targets are solid blocks. They are made from very pure aluminum nitride powder. This purity is critical. Even tiny impurities can ruin a chip. The targets are placed inside special PVD machines. The machine heats the target. It makes the aluminum nitride turn into vapor. This vapor travels and sticks to the wafer surface. It forms a thin, even film.

This aluminum nitride film does several important jobs on chips. One big job is managing heat. Chips generate a lot of heat. Aluminum nitride moves heat away quickly. This stops the chip from overheating. It keeps the chip working reliably. Another job is electrical insulation. Aluminum nitride is a very good insulator. It stops electricity from leaking where it shouldn’t. This helps make circuits smaller and faster.

The film also protects the chip. It acts as a barrier. It shields sensitive parts from damage or contamination. Aluminum nitride is very hard. It resists wear and chemicals well. This protection makes the chip last longer.

Producing these targets is difficult. It requires advanced materials science. The aluminum nitride powder must be extremely pure. It must have the right crystal structure. Then it is pressed and heated under precise conditions. This creates a strong, dense target. The target must perform consistently. Chip makers depend on this reliability for high yields.

Using semiconductor grade aluminum nitride targets improves chip performance. It helps create smaller, faster, more powerful devices. It is essential for modern electronics manufacturing.

Company Profile

Tanki New Materials Co.Ltd. focus on the research and development, production and sales of ceramic products, serving the electronics, ceramics, chemical and other industries. Since its establishment in 2015, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Aerogel, Aluminum Nitride, Aluminum Oxide, Boron Carbide, Boron Nitride, Ceramic Crucible, Ceramic Fiber, Quartz Product, Refractory Material, Silicon Carbide, Silicon Nitride, ect. please feel free to contact us.

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By air, by sea, by express, as customers request.

5 FAQs of Semiconductor Grade Aluminum Nitride PVD Target

Semiconductor grade Aluminum Nitride PVD targets are essential for making thin films used in electronics. People often have these common questions.

What makes semiconductor grade Aluminum Nitride different? It needs extremely high purity. Impurities can ruin electronic parts. Semiconductor grade targets have impurity levels measured in parts per million. This ensures the films work correctly.

Why is target density so important? High density matters. It stops particles from flying off during sputtering. Dense targets make the sputtering process stable. They also help create smooth, even films on the wafer. Low density targets cause problems.

How should we handle Aluminum Nitride targets? Handle them very carefully. Aluminum Nitride is brittle. It can crack or chip easily. Always use the right mounting methods. Follow the manufacturer’s instructions exactly. Proper handling prevents damage and waste.

What are the main uses for these targets? They deposit thin films. These films act as insulating layers or heat spreaders. You find them in LED devices, power electronics, and some sensors. They are key for managing heat and electrical insulation in chips.

What decides a target’s quality and reliability? Several factors matter. High purity is critical. High density is necessary. Consistent crystal structure throughout the target is vital. Precise manufacturing controls ensure the target performs well every time. Good targets give reliable results.