Application of hafnium silicide HfSi2 in material preparation

Overview of hafnium silicide HfSi2

Hafnium silicide is a transition metal silicide, a type of refractory intermetallic compound,

Because of its unique physical and chemical properties, it has been successfully applied to complementary metal oxide semiconductor components,

Thin film coatings, bulk structural components, electric heating elements, thermoelectric materials and photovoltaic materials and other fields.

Its nanomaterials show special electrical, optical, magnetic and thermoelectric properties,

It has potential application value even in the field of catalysis.

Product characteristics of hafnium disilicide

The product has high purity, small particle size, uniform distribution, large specific surface area and high surface activity.

Hafnium silicide HfSi2 application

Hafnium silicide is a transition metal silicide, a refractory intermetallic compound.

Due to its unique physical and chemical properties, silicide has been successfully used in CMOS devices,

Thin film coatings, block structures, electric heating elements, thermoelectric materials and photovoltaic materials, etc.

In addition, hafnium silicide nanomaterials also have special electrical and optical properties, have magnetoelectric and thermoelectric properties, and have potential applications in the field of catalysis.

Our hafnium silicide products have the characteristics of high purity, small particle size, uniform distribution, large specific surface area and high surface activity.

Hafnium silicide is most commonly used in ceramic materials to manufacture various high-temperature components and functional components.

The application of hafnium silicide in material preparation

1. Preparation of silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating.

Carbon fiber reinforced carbon (C/C) composite material is a new type of high temperature resistant composite material with carbon fiber as the reinforcement and pyrolytic carbon as the matrix. Because of its excellent high-temperature strength, ablation resistance and good friction and wear properties, the United States carried out research work on C/C composite materials for thermal structures in the early 1970s, and changed C/C composite materials from burning and heat-resistant materials to Development of thermal structural materials. C/C composite materials can be used as thermal structural materials for gas turbine engine structural components, space shuttle nose cone caps, wing leading edges, etc. Most of these components work in high temperature and oxidation environments.

However, C/C composite materials are easily oxidized, and usually cannot be serviced in an oxidizing atmosphere higher than 400 ℃. This requires proper anti-oxidation protection for C/C composite materials, and the preparation of anti-oxidation coatings is one of the main protective measures. Studies have shown that when refractory metals Zr, Hf, Ta, TiB2, etc. are added to the carbon matrix, the ablation resistance of C/C composites can be further improved. In order to understand the influence of metal Hf and Ta on the ablation performance of C/C composites, some experiments have used the embedding method to prepare SiC–HfSi2–TaSi2 anti-ablation coatings, and measured the anti-ablation coatings with oxyacetylene ablation equipment Ablation performance of the layer. Knot

2. Prepare an organic electroluminescent device. It includes an anode, a light-emitting layer, a cathode, and a packaging cover stacked in sequence. The packaging cover encapsulates the light-emitting layer and the cathode on the anode. The packaging cover includes a silicon carbonitride layer and a barrier layer formed on the surface of the silicon carbonitride layer The material of the barrier layer includes silicide and metal oxide, the silicide is selected from at least one of chromium silicide, tantalum disilicide, hafnium silicide, titanium disilicide, molybdenum disilicide and tungsten disilicide, the The metal oxide is selected from at least one of magnesium oxide, aluminum oxide, titanium oxide, zirconium oxide, hafnium oxide, and tantalum pentoxide. The above-mentioned organic electroluminescent device has a long life.

The invention also provides a method for preparing the organic electroluminescent device.

3. Preparation of a silicon-germanium alloy-based thermoelectric element. The silicon-germanium alloy-based thermoelectric element is composed of an electrode layer, a silicon-germanium alloy-based thermoelectric layer, and a barrier layer between the electrode layer and the silicon-germanium alloy-based thermoelectric layer, and the barrier layer is a mixture of silicide and silicon nitride, The silicide is at least one of molybdenum silicide, tungsten silicide, cobalt silicide, nickel silicide, niobium silicide, zirconium silicide, tantalum silicide, and hafnium silicide. The provided silicon-germanium alloy-based thermoelectric element has a good combination of interfaces, no cracks and obvious diffusion phenomena at the interface, low contact resistance, good thermal contact state, and can withstand long-term high-temperature accelerated tests. In addition, the provided preparation method has the characteristics of simple process, high reliability, low cost, no need for special equipment, and suitable for large-scale production.

4. Prepare a high temperature and oxidation resistant metal ceramic composite coating. The composite film is characterized in that the coating is composed of refractory metal, refractory carbide and intermetallic compound, and the thickness of the coating is 10 μm-50 μm. The refractory metal is one or more of molybdenum, tantalum, zirconium and hafnium; the composition of the refractory carbide is silicon carbide, and one or more of tantalum carbide, zirconium carbide and hafnium carbide The composition of the intermetallic compound is one or more of molybdenum silicide, tantalum silicide, zirconium silicide, hafnium silicide, tantalum silicide, zirconium carbon silicide and hafnium silicide; the crystal structure of the coating is composed of non- Composition of crystalline and/or polycrystalline nanoparticles.

Hafnium silicide HfSi2 powder price

The price of hafnium silicide HfSi2 powder will be related to the production cost, transportation cost, international situation, exchange rate and random changes in supply and demand. Tanki New Materials Co., Ltd. aims to help various industries and chemical wholesalers find high-quality, low-cost nanomaterials and chemicals by providing a full set of customized services. If you are looking for hafnium silicide HfSi2 HfSi2 powder, please feel free to send an inquiry to get the latest price of hafnium silicide HfSi2 powder.

Hafnium silicide HfSi2 powder supplier

As a global hafnium silicide HfSi2 powder supplier, Tanki New Materials Co., Ltd. has extensive experience in the performance, application and cost-effective manufacturing of advanced engineering materials. The company has successfully developed a series of powder materials (molybdenum disilicide, titanium silicide, calcium silicide, iron boride), high-purity targets, functional ceramics and structural devices, and provides OEM services.