Tantalum silicide has excellent properties such as high melting point, low resistivity, corrosion resistance

Overview of Tantalum Silicide TaSi2 Powder

Tantalum silicide has excellent properties such as high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance, and good compatibility with silicon, carbon and other matrix materials. It is used as the gate material, integrated circuit connection line, high temperature oxidation resistance coating, etc., Has been widely researched and applied in electric heating elements, high temperature structural parts, electronic devices, etc. Metal silicides have similar metal conductivity, high temperature performance, oxidation resistance and compatibility with the production process of silicon integrated circuits. Transition metal silicides can be used for low-resistance gates and interconnections, Schottky gates, and resistance contacts.

The preparation methods of tantalum silicide include combustion synthesis (combustion synthesis, CS) or self-propagating high-temperature synthesis, arc smelting and the like. Combustion synthesis or self-propagating high-temperature synthesis is a method of synthesizing intermetallic compounds using the exothermic heat of the element/compound reaction. It has the advantages of simple equipment, low energy consumption, and short synthesis time. Its main disadvantages are fast reaction speed, difficult process control, and prone to miscellaneous phases. The combustion synthesis of tantalum silicide requires preheating to initiate the reaction to achieve a synthesis, but there are phases other than disilicide.

Arc smelting generally requires a long homogenization time, and the loss of silicon due to volatilization during the smelting process may lead to the formation of some impurity phases. Plasma spraying technology combines the advantages of high-temperature melting, rapid solidification and near-net-shape due to its jet temperature up to 10000℃ and jet velocity up to 300-400m/s. The technology is not limited by shape or size, and is easy to achieve short Process preparation and forming has gradually developed into a new type of part forming technology, which has been used to prepare some parts. Plasma spraying technology is used to prepare tantalum silicide powder into the bulk material, which requires high-purity tantalum silicide powder as a raw material.

Applications of Tantalum Silicide TaSi2 Powder

Examples of tantalum silicide applications are as follows:

1. Prepare a silicon nitride-tantalum silicide composite ceramic material

The silicon nitride-tantalum silicide composite ceramic material has low porosity, and the ceramic material product can still maintain good mechanical properties during long-term operation and has a long service life. In addition, the silicon nitride-tantalum silicide prepared by the present invention Composite ceramic materials has high fracture toughness, which is conducive to meeting the market's increasing performance requirements for silicon nitride ceramic materials.

2. Preparation of tantalum silicide coating

Using tantalum silicide powder with a particle size range of 10~120 microns and a purity greater than 95wt%, the tantalum silicide powder is sprayed on the surface of the pretreated high-temperature resistant base material by vacuum plasma spraying process or low-pressure plasma spraying process to obtain tantalum silicide coating.

3. Preparation of a carbon/carbon composite material-based tantalum silicide/silicon carbide coating

The components included are tantalum silicide, silicon carbide, silicon and a small amount of transition metal carbide, which are prepared by using a secondary embedding method to directly embed and deposit a silicon carbide coating on the surface of the polished carbon/carbon composite material. Then, the tantalum silicide outer coating is deposited on the surface of the carbon/carbon composite material with the silicon carbide coating deposited by the embedding method. This kind of coating can effectively utilize the high-temperature oxidation resistance of tantalum silicide, increase the use temperature of carbon/carbon composite materials, fill the world’s gap in the research of carbon/carbon composite material-based tantalum silicide coatings, and serve for future carbon/carbon composite materials. The material has laid the foundation for long-term use at higher temperatures in this field.

 Tantalum Silicide TaSi2 Powder Price

Tantalum Silicide TaSi2 Powder price will vary randomly with the production cost, transportation cost, international situation, exchange rate, and market supply and demand of Tantalum Silicide TaSi2 Powder. Tanki New Materials Co.Ltd Aims to help All industries and Chemical Wholesalers to find high-quality, cheap price Nanomaterials and chemicals by providing turn-key customize manufacturing services. If you are looking for Tantalum Silicide TaSi2 Powder, please feel free to send an inquiry for the latest price of Tantalum Silicide TaSi2 Powder.

Tantalum Silicide TaSi2 Powder Supplier

As a global Tantalum Silicide TaSi2 Powder supplier, Tanki New Materials Co.Ltd has rich experiences in the properties, applications, and cost-effective manufacturing of advanced and engineered materials. The company has successfully developed a series of powder materials (including oxides, carbides, nitrides, single metal, etc.), high-purity targets, functional ceramics, and structural devices, OEM service is available.

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